Application Areas


Wafer Level MEMS Packaging

Unity® Sacrificial Materials are extremely useful in making completely encapsulated airgaps for WLMP.  They can be applied using a standard spin coat process and either photo-defined or dry etch patterned.  A suitable overcoat material can be applied.  Then the Unity® Sacrificial Sacrificial_Materials.jpgMaterial can be completely decomposed by treating the wafer with a simple thermal process. This ability of Unity® Sacrificial Materials to decompose even through unvented, solid overcoats makes them ideally suited for WLMP.

Microstructure Fabrication Materials:  Some Unity® Sacrificial Materials are well-suited to making 3-D microstructures.  They can be applied via standard spin coat process and photo-imaged.  Multiple coatings can be applied allowing for the fabrication of complex structures.  These structures can be overcoated and the Unity® Sacrificial Material decomposed leaving a free-standing microstructure.


Protective Coatings:  Photo-definable Unity® Sacrificial Materials can be applied to the wafer’s front or back side using a standard spin coat process and patterned to provide clear dicing streets and bond pad or thru-via areas without the need for a photoresist or an etching process.  This protective coating can be removed after the processing is complete by a simple thermal process with little material residue, and therefore, no further clean-up.


Temporary Wafer Bonding:  Unity® Sacrificial Materials for Temporary Wafer Bonding can be applied using a standard spin coat process, soft-baked to dry or pre-cure the layer and then used to bond the wafer to a carrier in a thermal compression bonder.  Wafer release after processing is by a simple thermal process with little material residue, and therefore, no further clean-up.  Low temperature grades have been developed for processes with thermal limitations and higher temperature grades have been developed for processes that require stability to higher temperatures, with subsequent de-bonding at even higher temperatures.  Photo-imageable materials are also available for edge-bead removal or other patterning needs.

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