Promerus Photoresist Polymers are custom-designed materials. We understand the needs and requirements of polymer systems for advanced resists. Our proprietary catalysts are highly effective for polymerization of norbornene-type monomers and are tolerant of functionalities allowing for tailoring of polymer properties. Our polymers offer a balance of transparency and etch resistance along with semiconductor quality cleanliness (metals typically <10 ppb on a solution basis). Please contact us for more information.