“GOALI: Advanced Photoresist materials for 193 nm and 157 nm Microlithography” is a joint project between PROMERUS LLC and Georgia Institute of Technology. This project aims to develop new polynorbornene based photoresist binder resins to improve technical performance of 193 nm and 157 nm resists. The primary goals of the project are three-fold: (a) to develop a better fundamental understanding of the relationship between polynorbornene resist polymer structure and resulting formulated resist material properties; (b) to develop a better fundamental understanding of the interaction and influence of photoacid generators with the photoresist resin; and (c) to design and characterize dissolution inhibitors for 193 nm and 157 nm photoresists. This is a three-year program and was awarded by NSF in October of 2003.
http://www.promerus.com/wp-content/uploads/2016/04/Promerus_LogoPantone7462-300x63.jpg 0 0 mjmadmin http://www.promerus.com/wp-content/uploads/2016/04/Promerus_LogoPantone7462-300x63.jpg mjmadmin2003-10-01 23:40:352016-04-14 23:40:52GOALI Project Funded by NSF